"

Cookies ussage consent

Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.

I agree, do not show this message again.

A 650 nm design for multilayer anti-reflection coating in GaAs solar cells

ALI BAHRAMI1,* , SHAHRAM MOHAMMADNEJAD1, NIMA JOUYANDEH ABKENAR1, SAEEDE SOLEIMANINEZHAD1

Affiliation

  1. Nanoptronics Research Center, Department of Electrical and Electronics Engineering, Iran University of Science and Technology, Tehran, Iran

Abstract

Theoretically optimized triple layer antireflection coating can be replaced with four layer LHLH structure around the designed wavelength. In this paper, triple layer and its four layer equivalent structure have been utilized as antireflection coating of GaAs solar cell and the reflectance coincidence of these structures is proved. The wavelength of 650nm has been assumed for design of multilayer structure. Also, the six layer antireflection coating is made with inserting one more HL pair in the structure. We design multilayer structures by introducing X parameter which describes 4- and 6-member set of thicknesses and finding the optimum combination of thicknesses. Simulation results confirm that the optimum case of six layer structure presents better performance in comparison with the best case of four layer coating..

Keywords

Anti-reflection coating; HLHL equivalent; GaAs; Solar cells.

Submitted at: Oct. 18, 2012
Accepted at: Sept. 18, 2013

Citation

ALI BAHRAMI, SHAHRAM MOHAMMADNEJAD, NIMA JOUYANDEH ABKENAR, SAEEDE SOLEIMANINEZHAD, A 650 nm design for multilayer anti-reflection coating in GaAs solar cells, Journal of Optoelectronics and Advanced Materials Vol. 15, Iss. 9-10, pp. 960-965 (2013)