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Application of dielectric barrier discharge for plasma polymerization processes

I. TOPALA1,2,* , M. ASANDULESA1, N. DUMITRASCU1, G. POPA1, J. DURAND2

Affiliation

  1. Plasma Physics Department, Faculty of Physics, “Al. I. Cuza” University, Blvd. Carol I, No. 11, 700506 Iasi, Romania
  2. Institut Européen des Membranes, Université Montpellier II, CC 067 Place Eugène Bataillon, 34095 Montpellier, France

Abstract

A new technique based on plasma polymerization at atmospheric pressure is presented in obtaining thin functional polymers films. A dielectric barrier discharge (DBD) is used to initiate the polymerization reaction of two monomers, acrylic acid (AAc) and N-vinyl formamide (NVF) as a source of hydroxyl and amino functionalities in the structure of the films. The discharge diagnosis was performed by electrical measurements and spatially resolved optical emission spectroscopy (OES). The wettability of polymer films was analysed by contact angle measurements and the chemical structure by attenuated total reflectance Fourier transform infrared (ATR-FTIR) spectroscopy. The experimental data proved that our DBD is working in the homogenous regime and the reactive species, such as molecular nitrogen and atomic oxygen, are presented in the discharge volume. The estimations of gas temperature given values around 340 K, concluding that thermal effects are excluded in the polymerization process. The DBD plasma exposure of PET films makes them more wettable, the water contact angle decreasing from 79° to 42°. After the polymerization reaction, the water contact angle was 20°, values corresponding to the deposited polymerised films. Based on ATR-FTIR spectra they were identified OH and NH functional groups in the chemical structure of plasma polymerized films..

Keywords

Acrylic acid, N-vinyl formamide, Polymerization, Dielectric barrier discharge.

Submitted at: March 1, 2008
Accepted at: July 10, 2008

Citation

I. TOPALA, M. ASANDULESA, N. DUMITRASCU, G. POPA, J. DURAND, Application of dielectric barrier discharge for plasma polymerization processes, Journal of Optoelectronics and Advanced Materials Vol. 10, Iss. 8, pp. 2028-2032 (2008)