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Ar rf plasma treatment of PET films for Si films adhesion improvement

I. A. RUSU1,* , G. POPA1, S. O. SAIED2, J. L. SULLIVAN2

Affiliation

  1. Plasma Physics Department, A.I. Cuza University, Iasi-700506, Romania
  2. Surface Science Research Group, EEAP, Aston University, Birmingham B4 7ET, UK

Abstract

The main aim of these studies was to find the most effective methods to improve the adhesion between thin silicon films and polymer surfaces. The PET films surface modifications induced by treatments in argon rf discharge were investigated using XPS analysis, contact angle method and AFM analysis. An rf magnetron system was used to deposit the thin Si layer on PET samples. The peel-load test offered quantitative information related to the adhesion between silicon layer and polymer surfaces..

Keywords

RF plasma, PET films, Adhesion, Si films.

Submitted at: Jan. 17, 2006
Accepted at: Sept. 13, 2006

Citation

I. A. RUSU, G. POPA, S. O. SAIED, J. L. SULLIVAN, Ar rf plasma treatment of PET films for Si films adhesion improvement, Journal of Optoelectronics and Advanced Materials Vol. 8, Iss. 5, pp. 1935-1938 (2006)