"

Cookies ussage consent

Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.

I agree, do not show this message again.

Barium magnesium tantalate thin films deposited by RF-magnetron sputtering from a stoichiometric target

V. BRAIC1,* , A. KISS1, A. IOACHIM2, M. TOACSAN2, L. NEDELCU2, M. BRAIC1

Affiliation

  1. National Institute for Optoelectronics, P.O.Box MG 5, Bucharest-Magurele, Romania
  2. National Institute for Materials Physics, P.O.Box MG 7, Bucharest-Magurele, Romania

Abstract

Barium magnesium tantalate thin films are attractive materials for high-performance dielectric ceramics for microwave devices, exhibiting a high dielectric constant, a low loss and a near-zero temperature coefficient. We report on the successful deposition of polycrystalline barium magnesium tantalate thin films by RF magnetron sputtering method. The structural and morphological characterization data are presented..

Keywords

Ceramic films, RF magnetron sputtering, Crystallographic structure, Elemental composition, Films’ morphology.

Submitted at: Nov. 11, 2010
Accepted at: Nov. 25, 2010

Citation

V. BRAIC, A. KISS, A. IOACHIM, M. TOACSAN, L. NEDELCU, M. BRAIC, Barium magnesium tantalate thin films deposited by RF-magnetron sputtering from a stoichiometric target, Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 12, pp. 2380-2385 (2010)