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Broadband antireflection and self-cleaning random grass structure on silicon

X. YE1,* , J. HUANG1, R.F. NI1,2, Z. YI1,2, X. D. JIANG1, W. G. ZHENG1

Affiliation

  1. Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China
  2. Joint Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology and Research Center of Laser Fusion, CAEP, Mianyang 621900, China

Abstract

We have developed a simple and scalable approach for fabricating random antireflective grass structures on silicon substrates. Theese structures are prepared by a two-step dry etching process. And they exhibit excellent broadband antireflection properties. The results show that the reflection of silicon wafer with the grass structures can be reduced to about 0.5% in the range UV to near-IR wavelength (300–1500 nm). Besides, the antireflective grass surfaces possess superhydrophobic properties. Such antireflective grass surfaces are promising for fabrication of antireflective and self-cleaning optical materials to be used in many important fields..

Keywords

Broadband antireflection, Self-cleaning, Random grass, Reactive ion etch, Deep reactive ion etch.

Submitted at: Dec. 19, 2014
Accepted at: Jan. 21, 2015

Citation

X. YE, J. HUANG, R.F. NI, Z. YI, X. D. JIANG, W. G. ZHENG, Broadband antireflection and self-cleaning random grass structure on silicon, Journal of Optoelectronics and Advanced Materials Vol. 17, Iss. 1-2, pp. 192-197 (2015)