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Chemical binding and structure of carbonic thin films with advanced properties studied by electron spectroscopy

V. ANDREI1,* , E. ANDREI2, GH. VLAICU3, C. STIHI3, G. DIMA3, C. OROS3, S. DINU3

Affiliation

  1. Institute for Nuclear Research, Pitesti, Romania
  2. National Institute for Research and Development in Micro and Nanotechnologies, Bucharest, Romania
  3. Valahia University of Targoviste, Physics Department, Targoviste, Romania

Abstract

There is considerable interest in new materials like the hard C-films, with good mechanical properties such as hardness, elasticity, low friction coefficient and chemical inertness. The properties of the carbonic thin films strongly depend on their chemical binding and microstructure. The ratio of sp3/sp2 carbon atoms is one of the most important factors governing the quality of the carbonic films. The ESCA (Electron Spectroscopy for Chemical Analysis) measurements were utilized to study the chemical binding in some carbon nitride thin films deposited using some plasma techniques (LCVD, Capacitively coupled RF plasma jet). A detailed analysis of the problem of assignment of spectral features in ESCA spectra is presented..

Keywords

Hard C-films, Electron spectroscopy for chemical analysis, Plasma techniques.

Submitted at: Jan. 12, 2006
Accepted at: July 15, 2007

Citation

V. ANDREI, E. ANDREI, GH. VLAICU, C. STIHI, G. DIMA, C. OROS, S. DINU, Chemical binding and structure of carbonic thin films with advanced properties studied by electron spectroscopy, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 7, pp. 2291-2295 (2007)