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Co-deposition of double layer antireflection coatings and laser induced damage threshold (LIDT) measurements at 1064 nm: Inhomogeneous systems

S. M. JAVED AKHTAR1,* , F. MITTENDORF2, H. SCHINK2, D.RISTAU3, J. EBERT4, H. WELLING2

Affiliation

  1. Optics Laboratories, P.O. Box 1021 Islamabad, Pakistan
  2. Institute of Quantum Optics, University Hannover, 3000 Hannover, Germany
  3. Laser Zentrum Hannover e.V., Hollerithallee 8, 30419 Hannover, Germany
  4. Laseroptik GmbH, Gneisenaustr. 14, D-30826, Garbsen, Germany

Abstract

Inhomogeneous antireflection coatings were prepared by simultaneous evaporation of high and low index materials during production of the interface region. Rates of evaporation for both materials were monitored by microprocessor controlled quartz crystals. Four designs were prepared, three of them consist of both oxides (Hafnia, Tantala, Zirconia / Silica) and the other one contains Cerium oxide in combination with Magnesium fluoride. Absorption and damage threshold values are presented..

Keywords

Evaporated inhomogeneous coatings, Antireflection coatings, High damage threshold coatings.

Submitted at: March 13, 2008
Accepted at: Oct. 7, 2008

Citation

S. M. JAVED AKHTAR, F. MITTENDORF, H. SCHINK, D.RISTAU, J. EBERT, H. WELLING, Co-deposition of double layer antireflection coatings and laser induced damage threshold (LIDT) measurements at 1064 nm: Inhomogeneous systems, Journal of Optoelectronics and Advanced Materials Vol. 10, Iss. 10, pp. 2515-2518 (2008)