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Deposition processes for high efficiency microcrystalline silicon solar cells

F. FINGER1,* , R. CARIUS1, X. GENG2, S. KLEIN1,3, Y. MAI1,2,4, M. SENDOVA-VASSILEVA5

Affiliation

  1. Forschungszentrum Jülich, Institut für Photovoltaik, 52425 Jülich, Germany
  2. Nankai University, Institute of Photoelectronics, Weijin Road 94, Tianjin 300071, PR China
  3. Applied Materials GmbH & Co. KG, Siemensstr. 100, 63755 Alzenau, Germany
  4. Utrecht University, Faculty of Science, P.O. Box 80000, 3508 TA Utrecht, The Netherlands
  5. Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria

Abstract

Examples of recent achievements in the preparation of microcrystalline silicon for solar cell application are shown. The requirements on the deposition process given by the needs to prepare material with an optimum phase mixture are demonstrated. A focus is on the VHF-PECVD technique in the high-power, high-pressure regime. The advantage of the HWCVD process for improved interface performance is shown. Introduction of a buffer layer allows one to apply a high deposition rate processes and to achieve record solar cell efficiencies of 10.3% for a single junction μc-Si:H pin..

Keywords

Microcrystalline silicon, Thin film solar cells, PECVD, HWCVD.

Submitted at: Nov. 1, 2006
Accepted at: Jan. 15, 2007

Citation

F. FINGER, R. CARIUS, X. GENG, S. KLEIN, Y. MAI, M. SENDOVA-VASSILEVA, Deposition processes for high efficiency microcrystalline silicon solar cells, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 1, pp. 92-98 (2007)