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Design of de-polarization long-wave-pass thin film edge filter

K. YU1,* , J. J. YIN1, J. Q. BAO1

Affiliation

  1. Department of Information Science and Technology, Wenhua University, Wuhan 430074, P. R. China

Abstract

In conventional multilayer dielectric thin film edge filter stack structure, the P-polarization and S-polarization light will separate obviously in oblique incidence, which will cause the broadening of the cutoff-band and the serious polarization dependent loss. In 45° oblique incidence, the cutoff-band polarization separation at 3 dB transmittance for the conventional long-wave-pass thin film edge filter is more than 50 nm. Based on the TiO 2 and SiO 2 as the high and low refractive index materials, an algorithm and a novel stack structure is proposed to design the de-polarization long-wave-pass thin film edge filter. Using the (4 L 2 H 4 L ) as the spacer layers, the cutoff-band polarization separation at -3 dB transmittance for the thin film edge filter is less than 2 nm at the incident angle of 45°. In this way, the de-polarization thin film edge filter can be easily designed and fabricated..

Keywords

Edge filter, Long-wave-pass, Oblique incidence, De-polarization.

Submitted at: Aug. 8, 2018
Accepted at: Feb. 12, 2019

Citation

K. YU, J. J. YIN, J. Q. BAO, Design of de-polarization long-wave-pass thin film edge filter, Journal of Optoelectronics and Advanced Materials Vol. 21, Iss. 1-2, pp. 18-21 (2019)