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Effective and rapid optical characterization of sequential multilayer metal oxide nanostructures by genetic algorithm approach

EBRU GUNGOR1,* , TAYYAR GUNGOR1, BIRSEN SAKA2

Affiliation

  1. Energy Systems Engineering Department, Burdur Mehmet Akif Ersoy University, Burdur 15030, Turkey
  2. Electrical and Electronics Engineering Department, Hacettepe University, Ankara 06800, Turkey

Abstract

In this paper, a modified genetic algorithm (M-GA) is proposed to simultaneously determine the optical constants of each successive layer of multilayer ZnO nanostructures. The thin films were produced by different sol-gel techniques in order to use in optoelectronic applications. The multilayer pure thin films were in the form of FilmA/Substrate/FilmA and FilmA/FilmB/Substrate. Unlike conventional methods, M-GA determines optical film parameters without the need of interference fringes of the experimental optical transmittance spectrum. M-GA gives good results for multilayer and double side coated thin film systems in our calculations. R-square values higher than 0.99 are obtained for typical film thickness of a few tens of nanometers..

Keywords

Modified genetic algorithm, Optical constants, Multilayer thin films, ZnO, Ultrasonic spray pyrolysis, Dip coating.

Submitted at: March 31, 2021
Accepted at: Oct. 7, 2021

Citation

EBRU GUNGOR, TAYYAR GUNGOR, BIRSEN SAKA, Effective and rapid optical characterization of sequential multilayer metal oxide nanostructures by genetic algorithm approach, Journal of Optoelectronics and Advanced Materials Vol. 23, Iss. 9-10, pp. 477-483 (2021)