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Electron cyclotron resonance assisted deposition of protective SiO2 films

S. KITOVA1,* , S. YOUROUKOV1, Tz. BABEVA1, G. DANEV1

Affiliation

  1. Central Laboratory of Photographic Processes, Bulgarian Academy of Sciences, acad.G.Bonchev str. Bl. 109., 1113 Sofia, Bulgaria

Abstract

Electron cyclotron resonance (ECR) assisted e-gun deposition of SiO2 films under conditions of oil-free vacuum has been studied. The SiO2 films were deposited under different Ar+-assisted conditions on the substrates of glass, Al and polycarbonate (PC). The optical characteristics of the layers were investigated in the VIS and IR ranges, together with their environmental stability and adhesion to substrates. The results obtained show that the films were transparent and defect-free. It was found that increases in the ion to atom ratio cion and Ar ion energy (up to 450 eV) led to film densification and, for films deposited at high deposition rate R, to the improvement of their environmental stability and adhesion to substrates..

Keywords

SiO2 films, ECR ion beam processing, Optical properties, Environmental stability, Adhesion.

Submitted at: Nov. 1, 2006
Accepted at: Feb. 15, 2007

Citation

S. KITOVA, S. YOUROUKOV, Tz. BABEVA, G. DANEV, Electron cyclotron resonance assisted deposition of protective SiO2 films, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 2, pp. 299-302 (2007)