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Fabrication and study of NiPc thin film based surface type photocapacitors

M. H. SAYYAD1,* , M. SHAH2, K. S. KARIMOV1,1, Z. AHMAD1, M. SALEEM1, M. MAROOF TAHIR1

Affiliation

  1. GIK Institute of Engineering Sciences and Technology, Topi, District Swabi, NWFP, 23640, Pakistan
  2. St. Cloud State University, 720 Fourth Avenue South St. Cloud, MN 56301-4498, USA

Abstract

In this paper, the study of nickel phthalocyanine (NiPc) as an active material in photocapacitive detectors is reported. The NiPc thin film based Al/NiPc/Al and Ag/NiPc/Ag surface type photocapacitive detectors were fabricated. The devices were prepared by thermal evaporation of NiPc films of different thicknesses on thoroughly cleaned glass substrates with preliminary deposited metallic electrodes. It was observed that photocapacitance of the samples increases with increase in thickness of the NiPc film and illumination as well. Under filament lamp illumination, the relative capacitance of the sample having aluminum electrodes was greater than the silver one. The photocapacitive response of the detectors is associated with polarization, due to the transfer of photo-generated electrons and holes. The equivalent circuit of the photocapacitive detectors is proposed. Data obtained by simulation showed reasonable agreement with the experimental results..

Keywords

Surface-type cell, NiPc, Polarization, Photocapacitor. Organic semiconductor.

Submitted at: June 28, 2008
Accepted at: Oct. 7, 2008

Citation

M. H. SAYYAD, M. SHAH, K. S. KARIMOV, Z. AHMAD, M. SALEEM, M. MAROOF TAHIR, Fabrication and study of NiPc thin film based surface type photocapacitors, Journal of Optoelectronics and Advanced Materials Vol. 10, Iss. 10, pp. 2805-2810 (2008)