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Gaseous Thermionic Vacuum Arc(G-TVA) - an extension of TVA (Thermionic Vacuum Arc) input materials from solid samples to gases and liquids for carbon thin film deposition

G. MUSA1,* , C. SURDU BOB1, C. P. LUNGU1, V. CIUPINA2, R. VLADOIU2

Affiliation

  1. National Institute for Laser, Plasma and Radiation, Bucharest, Romania
  2. Ovidius University, Constanta, Romania

Abstract

The aim of this paper is to find out the possibilities to extend the area of applications of Thermionic Vacuum Arc technology developed by our group for high quality thin fim deposition. We named this new technology Gaseous Thermionic Vacuum Arc (G-TVA). Through using a sintered filter various gaseous flows can be obtained, a process which is similar to anode evaporation under electron bombardment of anode by electrons as in the case of TVA discharge. The first step in our programme is to generate G-TVA discharges in carbon compounds like methane, acetylene, etc and to compare the obtained results with hydrogen free carbon films obtained using TVA..

Keywords

Gaseous thermoionic vacuum arc, Carbon, Thin films.

Submitted at: Nov. 2, 2006
Accepted at: April 15, 2007

Citation

G. MUSA, C. SURDU BOB, C. P. LUNGU, V. CIUPINA, R. VLADOIU, Gaseous Thermionic Vacuum Arc(G-TVA) - an extension of TVA (Thermionic Vacuum Arc) input materials from solid samples to gases and liquids for carbon thin film deposition, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 4, pp. 867-870 (2007)