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Glass polishing with bound-abrasive vibrating polishing tools

YAOCHUN FU1,* , YAGUO LI2,*

Affiliation

  1. School of Physics and Chemistry, Xihua University, Chengdu 610039, China
  2. Fine Optical Engineering Research Center, Chengdu 610041, China

Abstract

Fixed-abrasive polishing of fused silica glass in conjunction with vibration under dry conditions was developed. Preliminary results show that material removal rate can be raised by up to >50% by applying vibration in fixed-abrasive polishing of fused silica. The likely reasons are reckoned to be outstanding capability of dispelling debris populated at the interface between polishing tool and glass, which is considered to hinder polishing process. On the other hand, surface roughness of polished fused silica is slightly degraded in vibration polishing compared to that without vibration. Certain periodical structure resulting from vibration appears on the machined surface, of which the spatial period is consistent with vibration. The mechanism of material removal in dry polishing is due probably to the synergy of chemical and mechanical effects between ceria and silica in polishing tool and workpiece, respectively. Ceria in the tool first bonds with silica to form Ce-O-Si systems under extreme pressure and then the Si-O de-bonds owing to the greater strength of the Ce-O; this way, debris forms and glass is polished..

Keywords

Fixed-abrasive polishing, Ultrasonics, Fused silica, Chemical mechanical polishing.

Submitted at: April 22, 2013
Accepted at: Jan. 22, 2014

Citation

YAOCHUN FU, YAGUO LI, Glass polishing with bound-abrasive vibrating polishing tools, Journal of Optoelectronics and Advanced Materials Vol. 16, Iss. 1-2, pp. 70-75 (2014)