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Influence of film thickness on structural and optical properties of nanocrystalline tellurium films

P. DEEPAK RAJ1, R. VENKATESAN1, P. DHIVYA1, S. GAYATHRI1, M. SRIDHARAN1,*

Affiliation

  1. Functional Nanomaterials & Devices Lab, Centre for Nanotechnology &Advanced Biomaterials and School of Electrical & Electronics Engineering, SASTRA University, Thanjavur – 613 401, India

Abstract

Nanocrystalline tellurium (Te) thin films of different thickness were deposited onto thoroughly cleaned glass substrates using conventional thermal evaporation technique. The structural, morphological and the optical properties of the samples were investigated using X-ray diffraction (XRD), field-emission scanning electron microscopy (FE-SEM) and UV-Vis spectroscopy, respectively. The grain size values of the films were increased on increasing the thickness while the strain values were decreased. The optical band gap of the films were varied between 3.92 – 1.3 eV as analyzed by UV-Vis spectroscopy. The refractive index of the film was increasing with increase in thickness. The results were correlated to the decrease in the lattice defects on growing thicker films..

Keywords

Tellurium films, Thermal evaporation, X-ray diffraction, Optical properties.

Submitted at: Feb. 12, 2013
Accepted at: July 10, 2014

Citation

P. DEEPAK RAJ, R. VENKATESAN, P. DHIVYA, S. GAYATHRI, M. SRIDHARAN, Influence of film thickness on structural and optical properties of nanocrystalline tellurium films, Journal of Optoelectronics and Advanced Materials Vol. 16, Iss. 7-8, pp. 782-787 (2014)