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Influence of the substrate temperature on the optical and structural properties of magnetron sputtered ZnO thin films doped with Al and Er

D. DIMOVA-MALINOVSKA1,* , O. ANGELOV1, H. NICHEV1, M. KAMENOVA1, J. C. PIVIN2

Affiliation

  1. Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria
  2. CSNSM, CNRS-IN2P3, Batiment 108, 91405 Orsay Campus, France

Abstract

The influence of Al, and Er in ZnO thin films (ZnO:Al and ZnO:Er) deposited by magnetron sputtering at different substrate temperatures, Ts, on their optical and electrical properties was investigated. The optical band gaps, Eopt, of the films, from transmission and reflection spectra, ranged from 3.27 to 3.41 eV. The observed blue shift of Eopt for the Al doped ZnO (ZnO:Al) was explained by the Burstein-Moss effect. The Urbach band tail width was also calculated. Incorporation of Al and Er resulted in a reduced and an increase resistivity, ρ, respectively, and an increase in the Urbach tail width in both cases. The ρ of ZnO:Al decreases with Ts, while for un-doped and Er doped ZnO films it increases. A discussion of the influence of Ts and of Al and Er on the properties is presented..

Keywords

Thin films, ZnO, Electrical properties, Structural properties, Optical properties.

Submitted at: Nov. 26, 2006
Accepted at: Aug. 18, 2007

Citation

D. DIMOVA-MALINOVSKA, O. ANGELOV, H. NICHEV, M. KAMENOVA, J. C. PIVIN, Influence of the substrate temperature on the optical and structural properties of magnetron sputtered ZnO thin films doped with Al and Er, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 8, pp. 2512-2515 (2007)