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Ion beam assisted physical deposition of polyimide♣

D. DIMOV1,* , E. SPASSOVA1, J. ASSA1, G. DANEV1

Affiliation

  1. Central Laboratory of Photoprocesses, Bulgarian Academy of Sciences, Acad. G.Bonchev St., bl. 109, 1113 Sofia, Bulgaria

Abstract

Polyimide layers prepared by condensation of treated with an Ar plasma vapour flux of precursors - oxydianiline – ODA and pyromellitic dianhydride – PMDA, are studied. An influence on the structure of the so prepared layers, and as a consequence a change of their properties is expected. Through SEM analysis, considerable changes in the structures of the condensed precursors are shown. It is established that the ion assisted deposition leads to an increase in the layer thickening, with remarkable changes in their surface morphology. As a consequence of the thickening, the measured microhardness of the polyimide layers increases by more than 40 percent. These results confirm our suggestion that ion assisted deposition leads to an increase in the energy of the irradiated precursor molecules, and enhances the thickening of the condensed polyimide films. The FTIR analyses are interpreted as confirmation of the breaking of the chemical bonds, and in this way the “soft” plasma treating contributes to the imidization process..

Keywords

Polyimide, Ion beam, Physical deposition, Ar plasma.

Submitted at: Nov. 5, 2008
Accepted at: Oct. 3, 2009

Citation

D. DIMOV, E. SPASSOVA, J. ASSA, G. DANEV, Ion beam assisted physical deposition of polyimide♣, Journal of Optoelectronics and Advanced Materials Vol. 11, Iss. 10, pp. 1436-1439 (2009)