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Low pressure plasma-jet systems and their application for deposition of ceramic thin films

Z. HUBIČKA1,* , M. CHICHINA1,2, A. DEYNEKA1, P. KUDRNA1,2, J. OLEJNÍČEK1, H. ŠÍCHOVÁ2, M. ŠÍCHA1,2, L. JASTRABÍK1, P. VIROSTKO1,2, P. ADÁMEK3, M. TICHÝ2

Affiliation

  1. Institute of Physics, Academy of Sciences of the Czech Rep., Na Slovance 2, 182 21 Prague 8, Czech Republic
  2. Charles University in Prague, Fac. of Math. and Physics, V Holešovičkách 2, 180 00 Prague 8, Czech Republic
  3. University of South Bohemia, Fac. of Education, Jeronýmova 10, 371 15 České Budějovice, Czech Republic

Abstract

We applied the single and the double hollow cathode plasma jet systems for deposition of BaxSr1-xTiO3 (BSTO) thin films on Si and on multi-layer Si/SiO2/TiO2/Pt substrates. Two ceramic inserts in a single nozzle or two separate nozzles made of BaTiO3 (BTO) and SrTiO3 (STO) ceramics were reactively sputtered in the RF modulated plasma jet. The substrate was simultaneously heated on approximately 500 °C. Plasma parameters during the deposition process were determined by time-resolved measurements over the working (active pulse) and the idle part of the period. Electron density and electron effective temperature at the substrate position were determined by Langmuir probe technique, temperature of neutral particles and ratio of sputtered atoms (especially Ba and Sr) were estimated by optical emission spectroscopy. Elemental composition of the deposited films was estimated by electron microprobe analysis. Measured electron concentration in the substrate position reached value 2×1016 m-3 during the active part of the duty cycle and resulting effective electron temperature was approximately 5 eV. Temperature of neutral particles measured by means of rotational temperature of OH radicals was lower than 500 K and high correlation between ratio of spectral intensity of Ba and Sr lines and ratio of Ba and Sr atoms in BSTO thin film was observed. Knowledge of this correlation was used for deposition of compositional gradient BSTO thin films. XRD diffraction confirmed presence of BSTO and STO perovskite phase in the films..

Keywords

Plasma jet, Langmuir probe, STO and BSTO layers, Ceramic thin films.

Submitted at: Nov. 2, 2006
Accepted at: April 15, 2007

Citation

Z. HUBIČKA, M. CHICHINA, A. DEYNEKA, P. KUDRNA, J. OLEJNÍČEK, H. ŠÍCHOVÁ, M. ŠÍCHA, L. JASTRABÍK, P. VIROSTKO, P. ADÁMEK, M. TICHÝ, Low pressure plasma-jet systems and their application for deposition of ceramic thin films, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 4, pp. 875-880 (2007)