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Magnetron sputtering deposition and characterization of GdMnO3 thin films

E. VLAKHOV1,* , B. BLAGOEV2, E. MATEEV2, L. NESHKOV2, T. NURGALIEV2, L. LAKOV3, K. TONCHEVA3, Y. MARINOV1, K. NENKOV4,5, I. RADULOV5, K. PIOTROWSKI6, W. PASZKOWICZ6, A. SZEWCZYK6, M. BARAN6, R. SZYMCZAK6

Affiliation

  1. Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria
  2. Institute of Electronics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd, 1784 Sofia, Bulgaria
  3. Institute of Metal Science, Bulgarian Academy of Sciences, 67 Shipchensky prohod Str. 1574 Sofia, Bulgaria
  4. Institut für Festkörper- und Werkstofforschung Dresden, P.O.Box 270016, O1171, Dresden, Germany
  5. International Laboratory for High Magnetic Fields and Low Temperatures, 95 Gajowicka Str., 53 421 Wroclaw, Poland
  6. Institute of Physics, Polish Academy of Sciences, Al. Lotnikov 32/46, 02-668 Warszawa, Poland

Abstract

Thin films of GdMnO3 were deposited by RF magnetron sputtering on SrTiO3 (100) and Si (100) substrates. XRD analysis revealed that GdMnO3 films grown on SrTiO3 (100) substrates are well textured. The out-of-plane c axis is elongated by 0.75 % - 1.10 % in comparison to bulk lattice value and depends on film thickness. The minimal elongation was found for the GdMnO3 film deposited on a La0.7Sr0.3MnO3 (LSMO) buffer layer. M/H vs. T (5<T<100K) as well as M vs. H (T=5K) dependences obtained for a 100 nm thick sample of GdMnO3 / SrTiO3 (100) point to the absence of magnetic anisotropy unlike the case of a GdMnO3 single crystal. This effect is attributed to the significant structural disorder due to misfit stress. AC resistivity measurements show a measurable influence of the static magnetic field on the impedance parameters, in accordance with the (H, T)-phase diagram of the GdMnO3 single crystal..

Keywords

GdMnO3, Thin films, Magnetron sputtering, Misfit stress.

Submitted at: Nov. 1, 2006
Accepted at: Feb. 15, 2007

Citation

E. VLAKHOV, B. BLAGOEV, E. MATEEV, L. NESHKOV, T. NURGALIEV, L. LAKOV, K. TONCHEVA, Y. MARINOV, K. NENKOV, I. RADULOV, K. PIOTROWSKI, W. PASZKOWICZ, A. SZEWCZYK, M. BARAN, R. SZYMCZAK, Magnetron sputtering deposition and characterization of GdMnO3 thin films, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 2, pp. 456-459 (2007)