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Microstructure and magnetic properties of the Ni-Zn thin films electrodeposited in ultrasound field

C. PIRGHIE1,* , N. SULITANU2, V. NICA2

Affiliation

  1. Faculty of Mechanical Engineering, “Stefan cel Mare” University, 720225 Suceava, Romania
  2. Faculty of Physics, “Al.I.Cuza” University, 700506 Iasi, Romania

Abstract

This work is focussed on the microstructure and the magnetic properties of Ni-Zn thin films electrodeposited in an ultrasound field. There were used frequencies of 20 kHz and 1 MHz for different power of the ultrasound wave applied to the electrolytic bath. The crystal structure of films was investigated by XRD. The surface microstructure was evidenced with an atomic force microscope (AFM) and a metallographic microscope. There was determined the RMS roughness for different thin films electrodeposited without ultrasounds and with ultrasound for different power and for different time of deposition. We noticed that roughness decreases with the increase of ultrasound power for 1 and 2 minute time of deposition and increases with the increasing of the ultrasound power for 5 minutes time of deposition. The structure alteration of thin films deposited in the ultrasound field determines changes of magnetic properties. By changing the frequency and power of applied ultrasound on the electrolytic it is possible to control the microstructure of the films, and so we can control the magnetic properties. In order to get the magnetic properties we used vibrating sample magnetometer (VSM). The coercitivity, the remanence, the saturation magnetization and the magnetic anisotropy were studied for different conditions of deposition and for different parameters of ultrasounds. The power of ultrasounds was varied from 0 to 10 kW/m2..

Keywords

Microstructure, Electrodeposition, Ultrasounds, Ni – Zn thin films.

Submitted at: Nov. 14, 2006
Accepted at: May 15, 2007

Citation

C. PIRGHIE, N. SULITANU, V. NICA, Microstructure and magnetic properties of the Ni-Zn thin films electrodeposited in ultrasound field, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 5, pp. 1462-1464 (2007)