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Microwave assisted processes for producing thin layer materials in the field of nanotechnology

D. DIMOV1,* , A. GEORGIEV2, E. SPASSOVA1, I. KARAMANCHEVA2, Y. SHOPOV3, G. DANEV1

Affiliation

  1. Central Laboratory of Photoprocesses, Bulgarian Academy of Sciences, "Acad. G. Bonchev" St., bl. 109, 1113 Sofia, Bulgaria
  2. University of Chemical Technology and Metallurgy, Bul. Kl. Ohridski 8, 1756, Sofia
  3. Technikal University, “Kl. Ohridski” blv., 8, 1756 Sofia, Bulgaria

Abstract

The possibility of applying a microwave (MW) processes for producing thin layer materials has been studied. The experiments have been carried out with 200 nm thick polyimide (PI) layers prepared by vacuum deposition of PI precursors – oxidianiline (ODA) and pyromellitic dianhydride (PMDA), followed by thermal, MW or mixed treatment. FTIR spectroscopy investigations of the samples have shown that the MW treatment enhances the acylation processes, while not affecting the processes of imidization. The best results have been obtained by combined MW and thermal treatment..

Keywords

Thin polyimide films, Microwave processes, Imidization, FTIR Spectroscopy.

Submitted at: Nov. 1, 2006
Accepted at: Feb. 15, 2007

Citation

D. DIMOV, A. GEORGIEV, E. SPASSOVA, I. KARAMANCHEVA, Y. SHOPOV, G. DANEV, Microwave assisted processes for producing thin layer materials in the field of nanotechnology, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 2, pp. 494-497 (2007)