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Nanostructuring of chalcogenide glasses using electron beam lithography

M. VLCEK1,2,* , H. JAIN1

Affiliation

  1. International Materials Institute for New Functionality in Glass, Lehigh University, Bethlehem, PA, 18015, USA
  2. Department of General and Inorganic Chemistry, FCHT, University of Pardubice, Pardubice 530 12, Czech Republic

Abstract

We have investigated nanostructuring capabilities of As-S chalcogenide glasses using electron beam lithography. After exposure to electron beam the thin films of these inorganic glasses can be etched in alkaline amine solvent with high selectivity. Dissolution rate is linearly proportional to the electron dose and Gaussian electron beam intensity profile is well replicated in the shape of individual lines. High resolution smooth, shaped nanostructures have been fabricated in chalcogenide thin films with dimensions well below 100 nm and aspect ratio about 3..

Keywords

As-S, Chalcogenide glasses, Electron beam lithography, Nanostructure.

Submitted at: Oct. 26, 2006
Accepted at: Nov. 2, 2006

Citation

M. VLCEK, H. JAIN, Nanostructuring of chalcogenide glasses using electron beam lithography, Journal of Optoelectronics and Advanced Materials Vol. 8, Iss. 6, pp. 2108-2111 (2006)