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Nitridation and crystallization of titanium oxynitride by thermal treatment of TiO2-anatase films in NH

C. TRAPALIS1, J. M. CALDERON-MORENO2, N. TODOROVA1, V. S. TEODORESCU3, M. STOICA2, M. NICOLESCU2, M. ANASTASESCU2, M. GARTNER2,* , M. ZAHARESCU2

Affiliation

  1. Institute of Materials Science, NCSR “Demokritos”, 153 10, Athens, Greece
  2. nstitute of Physical Chemistry “Ilie Murgulescu” of the Romanian Academy, 202 Splaiul Independentei, 060021, Bucharest, Romania
  3. National Institute of Material Physics, 105 bis Atomistilor Street, 077125 Bucharest-Magurele, Romania

Abstract

Nitrogen is often used for doping TiO 2 films to improve their photocatalytic properties in visible light. Multilayer TiO 2 anatase films were deposited by sol–gel method on quartz substrate and thermally treated in O 2 and NH 3 flow in 500-800 °C range. The effect of the annealing treatment (temperature and atmosphere) on the structural properties of TiO 2 films was studied by X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), transmission electron microscopy (TEM) and selected area electron diffraction (SAED). Nitridation causes the amorphization of the anatase tetragonal phase at 600 °C. The film re-crystallization into the cubic oxynitride phase is observed at 800 °C. EDX results confirms that the incorporation of nitrogen into the amorphous films takes place before thermally activated growth of the oxynitride phase and demonstrates that the relative O:N composition in the crystalline phase is dependent on the temperature of the thermal treatment..

Keywords

sol-gel, TiO 2(N) films, XRD, SEM, TEM, SAED, Raman Spectroscopy.

Submitted at: Nov. 2, 2009
Accepted at: Nov. 19, 2009

Citation

C. TRAPALIS, J. M. CALDERON-MORENO, N. TODOROVA, V. S. TEODORESCU, M. STOICA, M. NICOLESCU, M. ANASTASESCU, M. GARTNER, M. ZAHARESCU, Nitridation and crystallization of titanium oxynitride by thermal treatment of TiO2-anatase films in NH, Journal of Optoelectronics and Advanced Materials Vol. 11, Iss. 11, pp. 1810-1814 (2009)