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Plasma surface interaction in integrated circuit production and biomedical applications♣

Z. PETROVIĆ1,2,* , M. RADMILOVIĆ–RADJENOVIĆ1, B. RADJENOVIĆ1, D. MARIĆ1, N. PUAČ1, G. MALOVIĆ1

Affiliation

  1. Institute of Physics Belgrade, PO Box 68, 11080 Zemun, Serbia
  2. Serbian Academy of Sciences and Arts, Knez Mihailova 35, 11000 Beograd, Serbia

Abstract

A review is presented of different techniques whereby non-equilibrium plasmas are optimized and adjusted to suit the needs of modern technologies. The reactive nature and high energy of ions allow plasmas to etch profiles or change the structure of the surface, leading to functional applications ranging from micro (nano)-electronics to biomedical applications. Non-equilibrium plasmas provide the means to develop a number of new technologies, by fine tuning the properties of fluxes of particles hitting the surface, and fundamental studies of plasmas provide the means to realize such optimizations of plasma sources..

Keywords

Plasma etching, charging, nano-structuring, micro discharges, biomedical applications.

Submitted at: Nov. 5, 2008
Accepted at: Sept. 9, 2009

Citation

Z. PETROVIĆ, M. RADMILOVIĆ–RADJENOVIĆ, B. RADJENOVIĆ, D. MARIĆ, N. PUAČ, G. MALOVIĆ, Plasma surface interaction in integrated circuit production and biomedical applications♣, Journal of Optoelectronics and Advanced Materials Vol. 11, Iss. 9, pp. 1163-1169 (2009)