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Polymer architectures in top-down (lithographically) defined channels for the bottom-up assembly of nanostructures

T. G. FITZGERALD1,2, F. BORSETTO1,2,3, J. M. O’CALLAGHAN1, B. KOSMALA1,2, M. T. SHAW1,2,3, J. D. HOLMES1,2, M. A. MORRIS1,2,*

Affiliation

  1. Materials Chemistry Section, Chemistry Department, University College Cork, College Road, Cork, Ireland
  2. Centre for Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, Ireland
  3. Intel (Ireland) Ltd., Leixlip, Co. Kildare, Ireland

Abstract

Here we demonstrate the use of block copolymer self-assembly combined with photolithographically defined topographic substrate surfaces to form highly regular templates for the development of nanowire arrays. In particular, we demonstrate that the use of well-defined channelled surfaces (channels of depth around 60 nm and widths as low as 163 nm) can be used to direct nanoscale phase separation in a number of block copolymer systems. This phase separation results in periodic structures of parallel and narrow (i.e. beyond the limits of photolithography) cylinders of one polymer in a matrix of the other. Processing of films is critical as film thickness requires careful control. Initial results are presented which show how these structures might be used for deposition of nanowire arrays..

Keywords

Polymer, Nanostructural, Nanowire arrays.

Submitted at: Nov. 15, 2006
Accepted at: March 15, 2007

Citation

T. G. FITZGERALD, F. BORSETTO, J. M. O’CALLAGHAN, B. KOSMALA, M. T. SHAW, J. D. HOLMES, M. A. MORRIS, Polymer architectures in top-down (lithographically) defined channels for the bottom-up assembly of nanostructures, Journal of Optoelectronics and Advanced Materials Vol. 9, Iss. 3, pp. 539-543 (2007)