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Preparation by dip coating method and characterization of WO3 thin films

L. MURESAN1,* , E. J. POPOVICI1, A. R. TOMSA1, L. SILAGHI-DUMITRESCU1,2, L. BARBU-TUDORAN3, E. INDREA4

Affiliation

  1. “Raluca Ripan” Institute for Research in Chemistry, 30 Fântânele, 400294 Cluj-Napoca, Romania
  2. Faculty of Chemistry and Chemical Engineering “Babes- Bolyai” University, 400028, Cluj Napoca, Romania
  3. Microscopy Center, “Babes- Bolyai” University, 400028, Cluj Napoca, Romania
  4. National Institute for R&D for Isotopic and Molecular Technologies, 400293Cluj-Napoca, Romania

Abstract

Preliminary results referring to the synthesis of tungsten oxide thin films with possible utilization as photoanode for water splitting are presented. WO3 thin films were deposited on optical glass substrate by dip coating method, using aqueous solutions of peroxotungstic acid (PTA). The dipping solution was prepared from tungsten oxide hydrate (WO3⋅xH2O) and hydrogen peroxide in well controlled conditions. After coating, the sol-gel derived films were heated at 250-5500C to complete the dehydration of the tungsten oxide precursors. Different characterization techniques were used to evaluate the crystalline structure (X Ray Diffraction-XRD), the morphology and particle size (Scanning Electron Microscopy-SEM), the behavior during the heating process (Thermal Analysis- TGA-SDTA) and optical and structural properties (UV-Vis and FTIR Spectroscopy) of tungsten oxide precursors and WO3 films. A correlation between preparation conditions and the characteristics of tungsten oxide precursors and WO3 films was established..

Keywords

Tungsten oxide, Thin films, Dip coating.

Submitted at: Feb. 25, 2008
Accepted at: Aug. 28, 2008

Citation

L. MURESAN, E. J. POPOVICI, A. R. TOMSA, L. SILAGHI-DUMITRESCU, L. BARBU-TUDORAN, E. INDREA, Preparation by dip coating method and characterization of WO3 thin films, Journal of Optoelectronics and Advanced Materials Vol. 10, Iss. 9, pp. 2261-2264 (2008)