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PtNiPd thin films obtained by Thermionic Vacuum Arc Method: synthesis and characterization

L. PETRĂŞESCU1,* , V. CIUPINĂ1,2,3, G. PRODAN2, C. POROŞNICU4, E. VASILE5, I. PRIOTEASA1, R. MANU1

Affiliation

  1. a Faculty of Physics, University of Bucharest, Atomiştilor 405, Măgurele, Ilfov, Romania
  2. Ovidius University of Constanta, Mamaia 124, Constanţa, 900527, Romania
  3. Academy of Romanian Scientists, Independenţei 54, Bucharest 050094, Romania
  4. National Institute for Laser, Plasma and Radiation Physics, PO Box MG-36, 077125, Bucharest, Romania
  5. University Politehnica of Bucharest, No. 1-7 Gh. Polizu Street, Bucharest 011061, Romania

Abstract

PtNiPd thin films on glass substrates were obtained by Thermionic Vacuum Arc (TVA) method. The nanostructured PtNiPd films were characterized by Transmission Electron Microscopy (TEM), electron diffraction, High Resolution Transmission Electron Microscopy (HRTEM), Energy Dispersive X-Ray Spectroscopy (EDXS), tribological analysis and electrical measurements..

Keywords

PtNiPd, TEM, HRTEM, Electron diffraction, EDXS, TVA, Tribological analysis, Electrical measurements.

Submitted at: Sept. 22, 2016
Accepted at: April 5, 2018

Citation

L. PETRĂŞESCU, V. CIUPINĂ, G. PRODAN, C. POROŞNICU, E. VASILE, I. PRIOTEASA, R. MANU, PtNiPd thin films obtained by Thermionic Vacuum Arc Method: synthesis and characterization, Journal of Optoelectronics and Advanced Materials Vol. 20, Iss. 3-4, pp. 196-200 (2018)