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Structural investigations of ion beam synthesized β-FeSi2♣

CH. ANGELOV1,* , BL. AMOV1, V. MIKLI2, R. TRAKSMAA2

Affiliation

  1. Institute for Nuclear Research and Nuclear Energy, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee blvd., Sofia 1784, Bulgaria
  2. Centre for Materials Research, Tallinn Technical University, Ehitajate 5, Tallinn 19086, Estonia

Abstract

High dose Fe ion implantation in n-type Si (100) was applied in order to fabricate the β-FeSi 2 phase. Two sets of samples, using two steps of ion implantation at energies of 60 plus 20 keV and 90 plus 25 keV, were performed, using different doses in the range 1x10 16 – 5x10 17 cm-2 . X-ray diffraction (XRD) spectra were used as a criterion for the formation of the β-FeSi 2 phase. The effects of the different doses, annealing temperature and annealing time on the surface morphology were investigated by scanning electron microscopy (SEM) and atomic force microscopy (AFM). The Fe depth distributions were simulated by SRIM code and the initial theoretical profiles were estimated..

Keywords

Fe + implantation, β-FeSi2 phase, X-ray diffraction, Atomic force microscopy.

Submitted at: Nov. 5, 2008
Accepted at: Oct. 3, 2009

Citation

CH. ANGELOV, BL. AMOV, V. MIKLI, R. TRAKSMAA, Structural investigations of ion beam synthesized β-FeSi2♣, Journal of Optoelectronics and Advanced Materials Vol. 11, Iss. 10, pp. 1490-1493 (2009)