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I agree, do not show this message again.The influence of an auxiliary discharge on the ablation plasma produced by a pulsed electron beam
M. NISTOR1, F. GHERENDI1, B. MANDACHE1,*
Affiliation
- National Institute for Lasers, Plasma and Radiation Physics, Plasma Physics and Nuclear Fusion Laboratory, L 22, P.O. Box MG-36, 77125 Magurele-Bucharest, Romania
Abstract
In this work we studied the effect of a pulsed auxiliary discharge on the plasma plume produced by ablation of a zinc oxide target using a pulsed electron beam generated by a channel-spark discharge. For an auxiliary discharge current peak of 400 A, a four times increase of the ion signal was measured using ion probes, revealing an increase of the ionisation degree of the ablation plasma. The estimated ion density was 5 x 1012 cm-3. An ion energy increase from 19 eV to 24 eV in the presence of the auxiliary discharge was calculated using the time of flight method for the ion signal peak..
Keywords
Pulsed electron deposition, Ablation plasma, Auxiliary discharge, Ion probes.
Submitted at: March 1, 2008
Accepted at: July 10, 2008
Citation
M. NISTOR, F. GHERENDI, B. MANDACHE, The influence of an auxiliary discharge on the ablation plasma produced by a pulsed electron beam, Journal of Optoelectronics and Advanced Materials Vol. 10, Iss. 8, pp. 2020-2023 (2008)
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