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The influence of deposition parameters on structural, optical and electrical properties of AZO thin film

E. CHIȚANU1,*

Affiliation

  1. National Institute for Research and Development in Electrical Engineering ICPE-CA, 313 Splaiul Unirii, 030138, Bucharest, Romania

Abstract

Al-doped ZnO (AZO) thin films were obtained by RFmagnetron sputtering deposition on the glass substrate, using a ceramic target (not sintered) ZnO:Al2O3(98:2 wt. %) and RF powers between 100 W and 200 W, with a step of 50 W.The AZOfilms werecharacterized by structural, optical and electrical investigations. The XRDpattern indicates the presence of single phase with hexagonal crystalline structure of ZnO. The AZOthin film obtained by using 200 W deposition power exhibited the best TCOelectrical and optical properties, reaching electrical resistivity of 1.20·10-3Ω·cm, charge mobility of 12.6 cm2/Vs and 85% transparency in visible range..

Keywords

AZO, Thin films, TCO, Magnetron sputtering.

Submitted at: Feb. 15, 2021
Accepted at: June 11, 2021

Citation

E. CHIȚANU, The influence of deposition parameters on structural, optical and electrical properties of AZO thin film, Journal of Optoelectronics and Advanced Materials Vol. 23, Iss. 5-6, pp. 270-274 (2021)