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The influence of the magnetron target state on the mechanical characteristics of hard coatings

E GRIGORE1,* , C. RUSET1

Affiliation

  1. National Institute for Laser, Plasma and Radiation Physics, P. O. Box MG-36, Bucharest, Romania

Abstract

The properties of the hard coatings deposited by PVD methods depend on the processes occurring at the surface of the vapors source (the target), within the plasma generated in the deposition chamber and at the plasma-substrate interface. The most investigated processes were those at the plasma-substrate interface and within the plasma volume. Less attention has been paid in the literature to the processes occurring at the level of the vapors source, although these ones play a decisive role in the reproducibility of thin films characteristics. In this paper the influence of the target condition on the properties of titanium nitride films deposited by using a relatively new method is presented. The deposition technique is a combination between magnetron sputtering and ion implantation (CMSII). The target condition during the deposition process is correlated with the evolution of the magnetron discharge impedance. The influence of the reactive gas flow on the impedance of the magnetron discharge was also investigated. As a result, a method for controlling the characteristics of the hard coatings by using the magnetron discharge impedance was established..

Keywords

Magnetron sputtering, Ion implantation, Thin films.

Submitted at: March 1, 2008
Accepted at: July 10, 2008

Citation

E GRIGORE, C. RUSET, The influence of the magnetron target state on the mechanical characteristics of hard coatings, Journal of Optoelectronics and Advanced Materials Vol. 10, Iss. 8, pp. 2024-2027 (2008)